中古 OXFORD Plasmalab 133 販売中

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OXFORD Plasmalab 133 #293824962

OXFORD

Plasmalab 133

Reactive Ion Etcher (RIE). 2"-12" Power: 600 W, 13.56 MHz RF Wafer thickness: 0.4 – 1.5 mm Etch rat
121
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OXFORD Plasmalab 133 #293824951

OXFORD

Plasmalab 133

Reactive Ion Etcher (RIE) Gas holder Control system Chiller Wafer sizes: 2″/3″/4″/5″/6″/8″/12″ Plasm
72
OXFORD Plasmalab 133 #293712618

OXFORD

Plasmalab 133

Reactive Ion Etcher (RIE) ADVANCED ENERGY HiLight 136 RF Generator Chamber: Etching chamber Loadloc
404
OXFORD Plasmalab 133 #9404282

OXFORD

Plasmalab 133

PECVD System.
363
OXFORD Plasmalab 133 #9090816

OXFORD

Plasmalab 133

RIE (FL) Dry etchers FL: Configured for fluorine based chemistry Set up for SiO2 etch Platen: 330 mm
401
OXFORD Plasmalab 133 #9090813

OXFORD

Plasmalab 133

RIE (CL) Dry etchers CL: Configured for chlorine based corrosive chemistry Set up for GaN etch Plat
380
OXFORD Plasmalab 133 #293824959

OXFORD

Plasmalab 133

Reactive Ion Etcher (RIE).
63