中古 ASML XT 760F #9237243 を販売中

DUV Scanner, 12" Locking kit TAMIS (EMTA): Z7 Offset: ±4.0 nm (-5.96) Z8 Offset: ±4.0 nm (-1.11) Z7 Tilt in X: ±2.0 nm/cm (-0.04) Z9 Offset: ±4.0 nm (0.48) SAMOS (EMCA): SAMOS: ≤3% (1.74) SLIT Uniformity (LUSU): - / NA / S.In / S.Out / Control spec / Down spec / Result Annular (M-Action) / 0.7 / 0.55 / 0.85 / 1.50% / 3.00% / 0.31 Conventional / 0.65 / 0 / 0.75 / 1.50% / 3.00% / 0.26 Conventional / 0.7 / 0 / 0.6 / 1.50% / 3.00% / 0.28 Model result parameter: Best focus: ±0.015 (0.002) Image height C1 (um): 0 ±0.015 (0.002) Image height C2 (um): 0 ±0.015 Image height different (um): 0 ±0.015 Image tilt ry C1 (urad): 0 ±0.5 (-0.279) Image tilt ry C2 (urad): 0 ±0.5 Image tiltry different (urad): 0 ±0.5 Intrafield: Focus range chuck 1 Before: <120 nm (91.6) Focus range chuck 2 Before: <120 nm Focus range chuck 1 After: <120 nm (89) Focus range chuck 2 After: <120 nm Focus range C1 different (nm): 0 +15 (2.6) Focus range C2 different (nm): 0 +15 Astigmatism range C1 different (nm): 0 ±5 (0.6) Astigmatism range C2 different (nm): 0 ±5 Result after correction: IPD Mean (nm): <120 (89) IPD STDEV (nm): <10 Astigmatism mean (nm): <70 (36) Astigmatism STDEV (nm): <10 Dose accuracy and repeatability performance (ODAR): Dose accuracy: <2.0 (max) (1.416) Dose repeatability: <0.5 (0.057) CARL ZEISS SMT Lens Charcoal filter External interface module Bottom module Reticle stage Covering panels frame parts Covering panels frame MCAB Covering panels RSRC Cabinet MCWC Cabinet MDC Cabinet LCWC Cabinet Exhaust cabinet Machine parts clean folder Side channel blower (6) Machine parts Double stage CYMER Laser not included.