中古 ASML PAS 5500 / 500 #9049994 を販売中

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ID: 9049994
Stepper with DNS tracks Slit Uniformity Operator:MSA Machine:XXXX Release:8.7.0 Date:09/05/2012 Time:18:01 Comment : Measurement mode Scanning : N Start position : Leftside Measurement settings Fieldsize [mm] X : 26.000 Y : 11.940 Steps X : 11 Y : 51 Number of Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Miscellaneous Apply REMA Window : Yes Illumination Mode Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Uniformity Measurement Results Uniformity [%] : 0.48 X-Tilt [%/field] : -1.08 Symmetrical error [%] : -0.14 Logfile : LI/LISU/waf.1225 Overall Average of Ratio : 1.00 Standard Deviation : 0.00 Intensities Spot Sensor [mW/cm2] : 585.60 Standard Deviation : 1.90 Intensities Energy Sensor [mW/cm2] : 586.80 Standard Deviation : 0.17 Estimated Uniformity from measured data [%] If corrected for actual tilt : 0.21 If corrected with gradient filter : 0.48 If corrected for tilt and with gradientfilter : 0.07 ############################################################################ ############################################################################ Slit Uniformity Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:02 Comment : Annular Measurement mode Scanning : N Start position : Leftside Measurement settings Fieldsize [mm] X : 26.000 Y : 11.940 Steps X : 11 Y : 51 Number of Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Miscellaneous Apply REMA Window : Yes Illumination Mode Illumination Mode : Annular Numerical Aperture : 0.57 Sigma Outer : 0.750 Inner : 0.450 Illumination mode name : annular Version : 1.0.0 Uniformity Measurement Results Uniformity [%] : 0.90 X-Tilt [%/field] : -1.75 Symmetrical error [%] : -0.37 Logfile : LI/LISU/waf.1224 Overall Average of Ratio : 1.00 Standard Deviation : 0.01 Intensities Spot Sensor [mW/cm2] : 605.13 Standard Deviation : 3.65 Intensities Energy Sensor [mW/cm2] : 606.53 Standard Deviation : 0.12 Estimated Uniformity from measured data [%] If corrected for actual tilt : 0.42 If corrected with gradient filter : 0.81 If corrected for tilt and with gradientfilter : 0.08 ############################################################################ ############################################################################ Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:10:38 Uniformity Measurement Comment : Image Field Size [mm] x : 26.0 y : 3.0 Diameter : 40.0 Steps x : 11 y : 3 Measurement Type : Pulse Mode Pulses : 100 Pulse Frequency [Hz] : 1000 Pulse Energy [mJ] : 10.00 Apply REMA Window : Yes Load Reticle : N Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Uniformity Measurement Result Uniformity [%] : 0.61 Logfile : LI/LIUM/waf.1443 Tilt X [%/field] : -0.91 Y [%/field] : -0.03 Overall Average of Ratio : 1.00 Standard Deviation : 0.00 Intensities Spot Sensor [mW/cm2] : 586.44 Standard Deviation : 1.93 Intensities Energy Sensor [mW/cm2] : 587.55 Standard Deviation : 0.38 Estimated Uniformity from measured data [%] If corrected for actual tilts : 0.37 If corrected with gradient filter : 0.45 If corrected for tilts and with gradientfilter : 0.26 Total Nr of Laserpulses since Installation [* 10^6] : 12454.98 Symmetric Uniformity Value [%] : 0.12 ############################################################################ ############################################################################ Scanning Dose Accuracy & Repeatability Test Operator:MSA Machine:XXXX Release:8.7.0 Date:08/22/2012 Time:09:19 Comment : Scanning : Y Scan Direction : Forwards Scan Type Settings : All scans SingleScan Die size [mm] X : 2.000 Y : 5.000 Spot Sensor Coordinates on Die [mm] X : 0.000 Y : -2.000 Rema Mode : Die Number of Repeats for each dose: : 100 Illumination Mode Illumination Mode : Conventional Numerical Aperture : 0.57 Sigma Outer : 0.750 Illumination mode name : conventional Version : 1.0.0 Dose Control Mode : High Performance Dose Control Logfile : LI/LISA/waf.149 Result Table +----------+-----------------------------------------+-------+--------+--------+ | | Recorded Exposure Energy Dose | | | | | +----------+--------+----------+----------+ | | | | Dose | Mean | Stddev | Min | Max |Repeat | Acc | Sum | | [mJ/cm2] | [mJ/cm2] |[mJ/cm2]| [mJ/cm2] | [mJ/cm2] | [%] | [%] | [%] | +==========+==========+========+==========+==========+=======+========+========+ | 5.00 | 5.09 | 0.00 | 5.08 | 5.10 | 0.24 | 1.77 | 2.00 | | 10.00 | 10.21 | 0.01 | 10.19 | 10.23 | 0.22 | 2.07 | 2.29 | | 20.00 | 20.31 | 0.01 | 20.28 | 20.35 | 0.18 | 1.56 | 1.74 | | 30.00 | 30.39 | 0.01 | 30.35 | 30.44 | 0.14 | 1.32 | 1.46 | | 40.00 | 40.54 | 0.02 | 40.50 | 40.59 | 0.11 | 1.35 | 1.45 | | 50.00 | 50.57 | 0.02 | 50.52 | 50.62 | 0.10 | 1.14 | 1.24 | | 100.00 | 101.04 | 0.05 | 100.93 | 101.16 | 0.11 | 1.04 | 1.15 | | 150.00 | 151.39 | 0.08 | 151.27 | 151.55 | 0.09 | 0.93 | 1.02 | +----------+----------+--------+----------+----------+-------+--------+--------+ Max. Repeatability [%] : 0.24 Min. Repeatability [%] : 0.09 Max. Accuracy [%] : 2.07 Min. Accuracy [%] : 0.93 Max. Sum [%] : 2.31 Min. Sum [%] : 1.02 ############################################################################ ############################################################################ ============================================================================== Dyn System Qual;Image Plane - ...ification/Dynamic/Single Energy/Model ; Dynamic Operator:MSA Machine:XXXX Release:8.7.0 Date:11/21/2012 Time:11:27 Exposure conditions: Exposure date and time : Sun Aug 19 11:46:56 2012 Machine ID : XXXX Reticle ID : 45441782A019 Reticle Alignment : TTL Align Lens type : 79 Temperature [degC]: 22.00 Pressure [mbar]: 1023.25 Illumination Mode : Conventional Blade ID : Not Applicable Numerical Aperture : 0.57 Sigma Inner : Not Applicable Sigma Outer : 0.75 Lens ID : 0105624A Focus Step [um]: 0.12 Focus Offset [um]: -0.90 Number of wafers : 2 Comments: 'Exposure': MPM 'Modelling': Data File Name: XXXX_MPM8_081912 ============================================================================== Uncorrected values: +----------------------------------------------------------+ | | Mean | Std. Dev. | |==========================================================| | Focus range [nm] | 148 | 20 | | Raw astigmatism [nm] | 106 | 6 | +----------------------------------------------------------+ Correctables: +-------------------------------------------+ | Image offset [um] | 0.049 | | Image tilt in x (Ry) [urad] | 0.195 | | Element 1 height [um] | 0.722 | | | | | RS linear wedge [urad] | -0.546 | | RS quadratic wedge [nm/cm2] | -3.749 | +-------------------------------------------+ Result after corrections: +----------------------------------------------------------+ | | Mean | Std. Dev. | |==========================================================| | Image plane deviation [nm] | 151 | 16 | | Astigmatism [nm] | 106 | 7 | +----------------------------------------------------------+ determined on 91 field positions. ############################################################################ ############################################################################ Operator:MSA Machine:XXXX Release:8.7.0 Date:08/18/2010 Time:17:42 Focus Reproducibility Measurements Position : Wafer Position X [mm] : 0.00 Y [mm] : 0.00 Number of measurements : 100 Output Data Type : Full Configuration Reference Branch : Y Fine p : Y q : Y Window Height [nm] Coarse : 250 Fine : 250 Tilt [urad] Rx : 100 Ry : 100 Absolute results +---------+------------+------------+------------+------------+ | | Z | Rx | Ry | TotZ | | | [um] | [urad] | [urad] | [um] | +=========+============+============+============+============+ | Avg | -9.7701 | -39.8370 | -38.0575 | -10.5218 | | Max | -9.7515 | -38.2445 | -36.3055 | -10.4992 | | Min | -9.7916 | -42.0147 | -39.8978 | -10.5497 | | Max-Min | 0.0401 | 3.7701 | 3.5923 | 0.0504 | | Stddev | 0.0079 | 0.6756 | 0.7289 | 0.0125 | +---------+------------+------------+------------+------------+ Relative results (to average) +---------+------------+------------+------------+------------+ | | Z | Rx | Ry | TotZ | | | [um] | [urad] | [urad] | [um] | +=========+============+============+============+============+ | Avg | 0.0000 | 0.0000 | 0.0000 | 0.0000 | | Max | 0.0186 | 1.5925 | 1.7521 | 0.0225 | | Min | -0.0216 | -2.1776 | -1.8402 | -0.0279 | +---------+------------+------------+------------+------------+ Termination Status terminated : Normally error count : 0 Measured data (Absolute) +------------+------------+------------+------------+ | Z | Rx | Ry | TotZ | | [um] | [urad] | [urad] | [um] | +============+============+============+============+ | -9.7655 | -40.5165 | -36.9648 | -10.5074 | | -9.7800 | -39.5127 | -37.1097 | -10.5173 | | -9.7769 | -39.7916 | -38.9125 | -10.5394 | | -9.7790 | -40.3539 | -38.2437 | -10.5364 | | -9.7785 | -39.5528 | -38.7713 | -10.5377 | | -9.7649 | -40.4179 | -37.2816 | -10.5102 | | -9.7732 | -42.0147 | -36.8241 | -10.5229 | | -9.7821 | -39.0658 | -38.4235 | -10.5336 | | -9.7652 | -39.7742 | -37.5021 | -10.5093 | | -9.7684 | -39.3748 | -37.6588 | -10.5119 | | -9.7652 | -39.5564 | -36.9409 | -10.5006 | | -9.7634 | -40.8306 | -37.7038 | -10.5169 | | -9.7515 | -40.6355 | -37.3565 | -10.4992 | | -9.7603 | -40.2630 | -37.1124 | -10.5025 | | -9.7786 | -39.3249 | -37.7339 | -10.5227 | | -9.7643 | -40.6762 | -37.9644 | -10.5202 | | -9.7675 | -40.4179 | -37.3377 | -10.5136 | | -9.7776 | -38.8425 | -38.0860 | -10.5232 | | -9.7718 | -40.2938 | -37.3000 | -10.5166 | | -9.7681 | -40.0046 | -38.3063 | -10.5241 | | -9.7748 | -39.3195 | -36.3055 | -10.5004 | | -9.7667 | -40.5930 | -38.2534 | -10.5258 | | -9.7868 | -39.8798 | -38.2696 | -10.5415 | | -9.7745 | -39.9436 | -38.9972 | -10.5391 | | -9.7645 | -39.8327 | -39.0892 | -10.5296 | | -9.7701 | -40.2804 | -36.7024 | -10.5070 | | -9.7814 | -40.2261 | -37.8231 | -10.5325 | | -9.7794 | -39.8133 | -39.0155 | -10.5434 | | -9.7750 | -39.0829 | -39.1232 | -10.5357 | | -9.7797 | -40.6502 | -37.6666 | -10.5315 | | -9.7672 | -40.4168 | -36.7030 | -10.5050 | | -9.7761 | -39.1525 | -38.2369 | -10.5258 | | -9.7870 | -39.0503 | -38.4891 | -10.5392 | | -9.7577 | -41.1639 | -36.8837 | -10.5027 | | -9.7570 | -41.1076 | -38.2929 | -10.5199 | | -9.7714 | -40.7037 | -37.9743 | -10.5276 | | -9.7568 | -39.8498 | -38.0060 | -10.5080 | | -9.7710 | -39.3692 | -39.7966 | -10.5423 | | -9.7646 | -39.8609 | -37.4839 | -10.5090 | | -9.7721 | -39.6824 | -38.3422 | -10.5265 | | -9.7604 | -39.2479 | -37.4802 | -10.5008 | | -9.7536 | -39.2437 | -38.4132 | -10.5061 | | -9.7657 | -40.2048 | -37.6258 | -10.5141 | | -9.7762 | -39.6844 | -37.8291 | -10.5239 | | -9.7702 | -38.8947 | -37.6470 | -10.5105 | | -9.7612 | -40.1875 | -38.2415 | -10.5176 | | -9.7792 | -39.8850 | -37.5037 | -10.5240 | | -9.7729 | -39.1850 | -37.2381 | -10.5098 | | -9.7613 | -40.7197 | -37.9457 | -10.5173 | | -9.7705 | -39.9194 | -39.2022 | -10.5376 | | -9.7564 | -38.9419 | -39.4759 | -10.5207 | | -9.7694 | -39.1124 | -39.8978 | -10.5404 | | -9.7720 | -39.1279 | -38.2178 | -10.5212 | | -9.7916 | -39.8522 | -38.5405 | -10.5497 | | -9.7741 | -40.0793 | -38.6619 | -10.5352 | | -9.7691 | -39.9331 | -38.1660 | -10.5228 | | -9.7792 | -40.3889 | -38.7946 | -10.5440 | | -9.7717 | -39.1853 | -37.4060 | -10.5107 | | -9.7745 | -40.9147 | -38.2744 | -10.5360 | | -9.7732 | -39.6131 | -37.6885 | -10.5187 | | -9.7787 | -39.9724 | -37.8588 | -10.5287 | | -9.7762 | -40.0535 | -38.1205 | -10.5301 | | -9.7629 | -40.5288 | -36.8900 | -10.5039 | | -9.7702 | -39.5173 | -37.6971 | -10.5151 | | -9.7761 | -39.9947 | -38.1668 | -10.5303 | | -9.7680 | -38.8518 | -37.8147 | -10.5102 | | -9.7658 | -39.8365 | -37.7452 | -10.5134 | | -9.7689 | -40.1078 | -37.1308 | -10.5103 | | -9.7742 | -39.4813 | -38.4813 | -10.5291 | | -9.7727 | -39.9902 | -37.2798 | -10.5153 | | -9.7634 | -39.8633 | -37.0637 | -10.5023 | | -9.7711 | -38.2445 | -37.7369 | -10.5083 | | -9.7732 | -40.2596 | -37.2719 | -10.5174 | | -9.7761 | -40.3531 | -37.6834 | -10.5262 | | -9.7766 | -40.0425 | -38.9605 | -10.5413 | | -9.7674 | -39.8253 | -38.4360 | -10.5239 | | -9.7772 | -39.5769 | -38.3233 | -10.5307 | | -9.7698 | -38.7025 | -39.2795 | -10.5301 | | -9.7688 | -38.7997 | -38.1785 | -10.5153 | | -9.7768 | -39.4022 | -37.5756 | -10.5194 | | -9.7820 | -39.3415 | -38.4344 | -10.5354 | | -9.7578 | -39.4880 | -38.3495 | -10.5110 | | -9.7767 | -39.9885 | -38.1482 | -10.5306 | | -9.7615 | -39.7493 | -39.0979 | -10.5262 | | -9.7602 | -39.8560 | -38.0996 | -10.5126 | | -9.7674 | -39.6038 | -39.2936 | -10.5336 | | -9.7559 | -39.3433 | -38.7500 | -10.5134 | | -9.7652 | -40.7314 | -37.6660 | -10.5176 | | -9.7556 | -39.0180 | -38.6828 | -10.5101 | | -9.7736 | -38.5990 | -38.6164 | -10.5246 | | -9.7659 | -40.0684 | -37.5131 | -10.5120 | | -9.7717 | -40.3805 | -39.0647 | -10.5400 | | -9.7767 | -40.0894 | -39.2315 | -10.5453 | | -9.7738 | -39.3731 | -38.5647 | -10.5291 | | -9.7687 | -39.5713 | -38.4534 | -10.5238 | | -9.7522 | -38.9775 | -38.4677 | -10.5037 | | -9.7614 | -41.1591 | -37.7801 | -10.5180 | | -9.7636 | -41.2565 | -38.6489 | -10.5321 | | -9.7665 | -38.2850 | -37.7461 | -10.5041 | | -9.7770 | -39.8987 | -38.2130 | -10.5312 | +------------+------------+------------+------------+ ############################################################################ ############################################################################ Dynamic System Qualification ; Distortion - ...ification/Dynamic/Model ; Dynamic Operator:ASM Machine:4418 Release:8.8.6 Date:11/26/2012 Time:11:19 System Qualification Exposure Layer : --- First --- Date/Time : Sun Aug 19 10:59:23 2012 Machine ID : XXXX Reticle ID : 45443171A103 Reference Grid : Matching set ID : NOMINAL Reticle Alignment : TTL Align Wafer Alignment : TTL Align Lens Type : 79 Lens ID : 0105624A Energy [mJ/cm2] : 33.0 Focus Offset [um] : 0.00 Illumination Mode : Conventional Blade ID : Numerical Aperture : 0.57 Sigma Inner : Sigma Outer : 0.75 Temperature [degC] : 22.0 Pressure [mbar] : 1023.4 Wavelength [nm] : 248.281 Comments from: 'Exposure First Layer' : MPM 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYD_XXXX_MPM8_081912.tlg Optimization Method : Least-Squares Number of Wafers : 1 Number of Rejected Wafers : 0 Number of Fields per Wafer : 12 Number of Marks per Field : 49 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : First to Nominal Set Threshold : OFF Reticle data used : Reticle data from testlog Reticle layout used : 4X_SU_DYNA_7X7 ============================================================================== Uncorrected values: +----------------------------------+---------+---------+ | | Mean |Std. Dev.| | | [nm] | [nm] | +==================================+=========+=========+ | max. image displacement x | 38.0 | 4.5 | | max. image displacement y | 37.5 | 7.4 | +----------------------------------+---------+---------+ Correctables: +------------------------------+----------+----------+ | | Mean |Std. Dev. | +==============================+==========+==========+ | RS height [um] | -0.072 | 1.431 | | RS tilt in x (Ry) [urad] | 216.176 | 32.303 | | Element 2 height [um] | 0.060 | 0.109 | | Translation in X [um] | 0.019 | 0.006 | | Translation in Y [um] | -0.004 | 0.005 | | Lens rotation [urad] | 0.157 | 0.116 | | Scan skew [urad] | 0.118 | 0.048 | | Scan scale [ppm] | 0.225 | 0.200 | +------------------------------+----------+----------+ Result after corrections: +----------------------------------+---------+---------+ | | Mean |Std. Dev.| | | [nm] | [nm] | +==================================+=========+=========+ | image distortion (NCE) x | 17.2 | 6.7 | | image distortion (NCE) y | 27.7 | 4.8 | +----------------------------------+---------+---------+ ############################################################################ ############################################################################ Model - ...ogy Verification/Overlay/Wafer Stage Accuracy/Dynamic/Single Velocity Operator:MSA Machine:XXXX Release:8.7.0 Date:05/06/2012 Time:07:12 Wafer Stage Accuracy Exposure Layer : --- First --- Date/Time : Sat May 5 17:30:29 2012 Machine ID : XXXX Reticle ID : 45443171A103 Reference Grid : Matching set ID : NOMINAL Reticle Alignment : TTL Align Wafer Alignment : No Align Lens Type : 79 Lens ID : 0105624A Energy [mJ/cm2] : 33.0 Focus Offset [um] : 0.00 Illumination Mode : Conventional Blade ID : Numerical Aperture : 0.57 Sigma Inner : Sigma Outer : 0.75 Temperature [degC] : 22.0 Pressure [mbar] : 1026.9 Wavelength [nm] : 248.278 Comments from: 'Exposure First Layer' : after hp laser replacement 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYW_SA_050512.tlg Optimization Method : Least-Squares Number of Wafers Measured : 1 Number of Fields per Wafer : 20 Number of Marks per Field : 25 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | -1 | -1 | | | St. Dev. | 2 | 2 | | | |Mean| + 3 Sigma | 7 | 7 | | | Maximum 99.7% | 7 | 7 | 8 | +------------------+---------+---------+---------+ Intrafield Overlay Error Classification: +------------------------------+---------------------+---------------------+ | | Model Parameters |Max. Resulting Errors| | +----------+----------+----------+----------+ | | Mean |Std. Dev. | Mean |Std. Dev. | | | | | [nm] | [nm] | +==============================+==========+==========+==========+==========+ | Translation in X [um] | -0.001 | 0.001 | -1 | 1 | | Translation in Y [um] | -0.001 | 0.002 | -1 | 2 | | Rotation [urad] | -0.008 | 0.066 | -0 | 1 | | Magnification [ppm] | -0.029 | 0.086 | -1 | 2 | | 3rd Order Dist. [nm/cm3] | 0.266 | 1.537 | 1 | 3 | | Trapezoid in X [um/cm2] | | | | | | Trapezoid in Y [um/cm2] | | | | | | 4th Ord. Trap. X [um/cm4] | | | | | | 4th Ord. Trap. Y [um/cm4] | | | | | | Asymm. Rotation [um] | 0.009 | 0.062 | 0 | 1 | | Asymm. Magnification [ppm] | -0.003 | 0.108 | -0 | 2 | +------------------------------+----------+----------+----------+----------+ Residuals for this batch: +--------------------+---------+ | | Value | +====================+=========+ | Residual X [nm] | 1 | | Residual Y [nm] | 1 | +--------------------+---------+ Wafer Stage Classification: +---------------------------+---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +===========================+=========+=========+=========+ | Stage Repeatability | 3 | 4 | | | Stage Accuracy | 7 | 7 | 8 | +---------------------------+---------+---------+---------+ ############################################################################ ############################################################################ Model - Metrology Calibration/Machine Matching/Intrafield Operator:MSA Machine:XXXX Release:8.7.0 Date:09/22/2012 Time:08:52 Machine to Machine Matching Exposure Layer : --- First --- : --- Second --- Date/Time : Thu Oct 26 10:52:45 2000 : Sat Sep 22 08:16:35 2012 Machine ID : XXXX : XXXX Reticle ID : 45441181A015 : 45441181A015 Reference Grid : : Matching set ID : DEFAULT : ORIGINAL Reticle Alignment : TTL Align : TTL Align Wafer Alignment : TTL Align : TTL Align Lens Type : 79 : 79 Lens ID : 0105624A : 0105624A Energy [mJ/cm2] : 30.0 : 33.0 Focus Offset [um] : 0.00 : 0.00 Illumination Mode : Default : Conventional Blade ID : : Numerical Aperture : 0.57 : 0.57 Sigma Inner : 0.00 : Sigma Outer : 0.75 : 0.75 Temperature [degC] : 22.0 : 22.0 Pressure [mbar] : 1014.1 : 1021.8 Wavelength [nm] : 248.288 : 248.282 Comments from: 'Exposure First Layer' : 'Exposure Second Layer' : 'Measure Mark Positions' : WPM 'XY-Imaging Modelling' : Test Log Name : XYM_zmatchbcf09222012.tlg Optimization Method : Least-Squares Number of Wafers Measured : 1 Number of Fields per Wafer : 16 Number of Marks per Field : 17 Alignment Errors in Data : 0 Max Field Size X [mm] : 26.0 Y [mm] : 33.0 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | 0 | 0 | | | St. Dev. | 5 | 6 | | | |Mean| + 3 Sigma | 14 | 18 | | | Maximum 99.7% | 14 | 21 | 24 | +------------------+---------+---------+---------+ Maximum Overlay Error positions for this Batch: +------+---------+---------+---------+-------------------------------+ | | | | |Corresponding Position in Field| | | | | +---------------+---------------+ | Nr | Max DX | Stdev | DY | X | Y | | | [nm] | [nm] | [nm] | [mm] | [mm] | +======+=========+=========+=========+===============+===============+ | 1 | 6 | 3 | 2 | 0.000 | -10.800 | | 2 | 5 | 4 | 2 | 10.800 | 0.000 | | 3 | 4 | 4 | 1 | 0.000 | -6.480 | | 4 | 4 | 2 | 2 | -10.800 | 0.000 | | 5 | 3 | 5 | 1 | -6.480 | 6.480 | | 6 | 3 | 6 | 1 | 10.800 | 10.800 | | 7 | 3 | 5 | 3 | 0.000 |
ASML PAS 5500/500は、半導体産業で集積回路の製造に使用されるウェハステッパーです。これは、基板上の特徴をフォトリソグラフィックで定義するためにレーザーを使用します。装置は高精度で、最大0。2ミクロンの幅を持つイメージング機能が可能です。硬いフレーム上に構築され、歪みや振動を最小限に抑え、精密な画像処理に適しています。このシステムは、従来のアルゴンイオンレーザーと比較して優れた性能を持つF2レーザー源を使用しています。均一なビームを提供し、より正確なイメージングを可能にします。レーザーはミラーおよびレンズの光学経路の助けによって単位に結合され、ウェーハの露出を制御するのに光機械式シャッターが使用されます。VPAS(ビデオプロジェクションアライメントツール)を採用し、光学アライメントの精度を高めています。このアセットは、ウェーハ上のグリッドパターンの投影を使用します。アライメントセンサーは、誤差を最小限に抑えるためにウェーハの位置と傾きを検出します。PAS 5500/500はまた、ウェーハと光学系を正確に配置するために2種類のインジェクタを使用しています。メカニカルインジェクタは大きなステップに使用されますが、ピエゾインジェクタは小さなステップに使用されます。インジェクターは、正確な回転運動を保証する電動回転ステージと統合されています。ASML PAS 5500/500は、線形駆動モデルを使用してXY方向に移動します。ポジションエンコーダ、モータ、ステップモータで構成されています。この装置はまた、イメージングプロセスを支援するいくつかの光学要素を備えています。顕微鏡、反射鏡、虹彩、コンデンサーなどがあります。このシステムは、イメージングプロセスに明確に定義されたステッピングアルゴリズムを使用します。これには、露出時間、投与量、および繰り返し数の設定が含まれます。繰り返し回数は、パターンがウェーハ上でイメージされる回数を決定します。この機能は、スキャン終了認識ユニットとともに、正確なイメージングと最適化されたスループットを実現します。このマシンは、マスク生成プロセスを支援する自動フォトマスク作成(APC)ソフトウェアと統合されています。マスクアライメント、ダイ登録、OPCなどの機能が含まれています。全体として、PAS 5500/500は、半導体製造に使用される高精度で自動化されたウェーハステッピングツールです。F2レーザーソース、光アライメント用VPAS、 APCソフトウェアなどの高度な機能を利用して、優れたイメージング性能を実現しています。
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