中古 ASML PAS 5500 / 1100B #9161690 を販売中

ArF Scanner, 8" 193nm Lithography Signal tower: Local SPM Alignmet: Standard Optical prealign mark sensor: Standard Wafer type: Notch FAT Attendance: Yes Laser type: CYMER Laser Extended exposure: Yes IRIS-6 Inch reticles: Yes Cassette elevator position: 1 / 2 Wafer track interface: TEL Mark 5 / 7 / 8 / ACT8 SECS I / II Interface: Yes Batch streaming: Advanced RMS Tape streamer OCU-MK4 / Less: Yes Single reticle SMIF handling: Yes Sign All: Yes Reticle SMIF pod tag reader: Stepper version Metrology data interface: Yes Reticle barcode reader 24 char: Yes Extended exposure translation: Yes ASF E-Chuck flatness qualification: Yes ASF Applic specific lensheet: Yes CSRs Vanous: CSR4066 / CSR 4442 Extended exposure: Yes 25m Hose / Cable set: Yes Multiple exposure: Yes Quasar: Yes (DOE ID13 MP4 30 Included) ASF Small marks: Yes IOSc-3 Packages: Yes PEP1100: Yes Dosemapper: Yes ASF Improved TIS measurement: Yes Hertz: 60 Hertz Power: 208 Volt Key tool performance indicators: Focal plane deviation [nm]: 98 Astigmatism [nm]: 68 Lens distortion measured 139 points / field: Non-correctable error [nm] NCE X: 2.7 NCE Y: 1.7 Dynamic performance: Moving standard deviation mean +3 Sigma: 7.5 Moving average mean +3 Sigma: 1.9 Focus repeatability (3σ) [μm]: 0.021 Level-ling repeatability: Rx (3σ) [μrad]:1.02 Ry (3σ) [μrad]:1.11 Overlay performance: Stage repeatability: X [nm]: 1.6 Y [nm]: 3.1 Single machine overlay: 99.7% X - Max 99.7%: 7.7 Y - Max 99.7%: 7.3 Matched machine overlay (99.7%): 10.6 Material handling: X Position (3σ) [μm]: 0.39 Y Position (3σ) [μm]: 1.92 Rotation θ (3σ) [μrad]: 18.21 Image quality control: 3σ Image sensor measurements: Focus repeatability: 4.78 Image tilt repeatability (Rx): 0.23 Image tilt repeatability (Ry): 0.31 Translation repeatability: 0.69 Magnification repeatability: 0.03 Die rotation repeatability: 0.06 Reticle inspection systems IRIS option: Size and position reproduciblity: Position range / Size standard deviation: 0.997 Inspection time [s]: 140 Stray light: Cleaning trigger: 3.22% Tamis: Z7: 0.592 Z8: 1.271 Z9: 0.29 Additional elements tool include: Laser 4kHz: Upgraded source / CYMER 7600A Laser IRIS: Reticle inspection system Dose mapper IOSc 3+: Overlay improvement Quasar: Automated DOE exchanger Metrology data interface.