中古 CVC 601 #28214 を販売中

Batch type production sputtering system, up to 8" Currently setup for Argon and Oxygen with the possibility for Nitrogen Computer and cryopump included Works in manual mode 4 targets / wafer holders Top loading machine (Qty 4) work stations in the flat bottom of the 7" high work chamber (Qty 2) DC stations (Qty 1) RF station (Qty 1) Ion cleaning station Work heater / sintering accessory in the lid Accessories for sputtering in several modes including DC Diode, RF Diode, DC Plasma Enriched Deposition ( PED, planar magnetron) and RF PED Composed of a relay rack control center and cabinet which contains the vacuum chamber and pumping system The computer interface is a Gould Model 484 Programmable controller The DC Sputter Supply is an 10 KW Advanced Energy MDX Magnetron Drive Unit has a CVC 3 KW AC Power Supply and a CVC 1 KW AC Supply (Qty 4) Targets include: Barium Titinate Molybdenum Trioxide Inconel Titanium or Silicon There are 4 target positions: (Qty 1) RF Magnetron gun and matching unit (Qty 2) DC Diode Sputtering unit with magnets in them for magnetron sputtering The 4th target position has an Ion Cleaning Source Project used only the RF PED Target position, DC targets were not used, in manual mode Previous project used system with a P190/484 Programming panel (Qty 2) Mass Flow Controllers There is a cryo controller for N2-purge, and regeneration Log book included Packaged and stored As-is 1986 vintage.