中古 BALZERS LLS 801 #293714638 を販売中

ID: 293714638
Sputtering system DC and RF sputtering RF etching Working chambers Load lock chamber Main chamber (3) Gases Spare parts: (12) Substrate holders carousel (4) Infrared heating units MC chambers (3) Dust-proof metal cabinet Pressure tank liquid Nitrogen End electron tube RF source Annealing oven, 1200°C Vacuum pumping system DUO 030A Rotary vane pump Pumping speed: 30 m³/sec Partial pressure: 1.3 x 10^-4 mbar Turbomolecular pump type: TPH 170 Pumping speed: 170l/sec Rotation speed: 43,000 rpm Final pressure: 5 x 10^-8 up to 1 x 10^-9 mbar CRYOGENIC Pump type: UC 010 229-T Helium gas purity: 99.995% Max pressure: 21.7 kg / cm² and 1.0 m³ / min at 50 Hz Vacuum measurement and control: PIRANI cold catode type: PKG 100 Measuring range: 1 x 10³ - 4 x 10^-10 mbar Ionization scale type: IMG 060 B Measuring range IMR 110 max: 10 x 10^-1 mbar min 1 x 10^-6 mbar Measuring range IMR 120 max: 1 x 10^-2 mbar min 1 x 10^-9 mbar Multi pirani meter: LC chamber MC chamber Cryopump Measuring range: 1 x 10³ - 5.6 x 10^-4 mbar Magnetrons (3) DC magnetron (3) DC sputtering RF magnetron RF sputtering Heating: (4) HIY tesla infrared lamps Power supply: 2400k, 230V, 1kW Power supply: DC source type: MPS 120 Power: 20 kW Input: 38.2 VA RF source type: RFL 102 Power: 2 kW Frequency: 13.56 kHz (2) Block tunings.
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