中古 AMAT / APPLIED MATERIALS New Aristo (NAR) 1200 #293763723 を販売中

Vertical inline sputtering system Applications: SiO2 / ITO Throughput: 332 Substrates/h Compressed air pressure: 5.5 Bar Chamber: Material: Stainless steel Vacuum leakage: ≤1x10-8 mbar l/sec Carrier transfer system: AC Motor Conveyor One feedthrough per chamber Substrate carrier: Material: Aluminum Dimensions: 1700 x 1100 mm² 1700 x 980 mm² Vacuum measuring equipment: Pirani vacuum meter type: TPR 280 Cold Ionization vacuum type: PKR 251 Capacitance vacuum meter type: MKS Baratron 627 Sputter cathode: Type: DC Magnetron Material of backing plate: Cooper with cooling channel Target fixing: Bonding Magnetic field: SiO2: Magnet array ITO Target size: ITO: 1400 x 190 x 6/9 mm SiO2: 100 x 100 x 16 mm Cooling water specification: Pressure minimum / Maximum: 5/7 bar Water inlet temperature range: 15° C-25° C Constant temperature: ±2°C Hardness of water: 6-8°dH pH Value: 8-10 Foreign particles: Size: Maximum 100 µm Concentration: Maximum 10/cm³ Dissolved C1: Maximum 20mg/l Dissolved CO2: Maximum 15 mg/l Sputter gas: Argon Argon/Oxygen (95/5) Oxygen Nitrogen Ambient requirements: Temperature machine control room: 20°-25° C Relative humidity: ≤ 60 % Vacuum data: Entrance / Exit chamber: ≤ 2 E^-02 hPa Transfer chamber: ≤ 5 E^-06 hPa Process chamber: ≤ 5 E^-06 hPa Purity of sputter gas: 99.999% Turbo molecular pump Rotary pump Roots pump ADVANCED ENERGY MDX Power supply Heater system PC Operating system: Windows Power supply: 400 V, 3 Phase, 60 Hz, 5 Wires (3 AC, N, PE).