中古 AG ASSOCIATES Heatpulse 4108 #9146377 を販売中

Rapid thermal processor annealing system, 5"-8" Includes: Process chamber: Two high-intensity tungsten halogen lamp arrays STD Bus for real-time operation Quartz isolation tube Robot / Robot controller Gas control electronics ULPA Filtration system Graphic user interface (GUI) computer system Electronics Mass-flow-controlled gas handling Cooling Mechanical assemblies Applications: Silicon dielectric growth Implant annealing Glass re-flow Silicide formation and annealing Nitridation of metals Contact alloying Oxygen donor annihilation Wafer handling: Automatic serial processing Standard cassettes Throughput: Process dependent Ramp-up rate: Programmable Range: 1 – 180°C Per second Steady-state duration: 1 – 600 Seconds per step Ramp-down rate: Programmable Temperature Radiation dependent Range: 1 – 180°C Per second Maximum: 150°C per second Recommended steady-state temperature range: 400 – 1200°C ERP Temperature accuracy: +5°C to -9°C Calibrated against an instrumented thermocouple wafer (ITC) Temperature repeatability: + 7°C Temperature uniformity: + 10°C.