中古 AMAT / APPLIED MATERIALS Endura 5500 #9219406 を販売中

System, 8" Wafer shape: SNNF MF Facilities: Bottom Chamber 1: STD WC Body Process 1: ESC AL Chamber 2: Wide body Process 2: TTN Chamber 3: Wide body Process 3: TTN Chamber 4: Wide body Process 4: Ti Chamber A: Pass through Chamber B: Cooldown Chamber C/D: PCII Process C/D: Oxide etch Chamber F: O/D With temp Heat exchanger 1: NESLAB I Loadlock pump type: iL600 Transfer robot type: HP+ Transfer robot blade: Metal Buffer robot type: HP+ Buffer robot blade: Metal Wafer sensor: Mini beam Loadlock type: Narrow BD without tilt out System umbilical: 50 ft EMOs: Turn to release Hard drive: SCSI (2) CRTs GEM: No OTF: No No Facility power (UPS) No loadlock pump Loadlock slit valve O-rings: Viton (Black) Heat exchanger 1: NESLAB Heat exchanger 2: M-Pack Main AC box: 480 V, Wide type Chamber A: Chamber type: Pass through Chamber lid: STD Lid Lift hoop & finger Pedestal type: Standard Chamber B: Chamber type: Cooldown Gas valves: Fujakin Heater / Cathode cooling: PCW Chamber lid: STD Lid Pedestal type: Standard without TC option Chamber C: Chamber type: PCII Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: Oxide etch Lid type: RF Resonator RF Gen / DC supply 1: COMDEL CPS-1001S RF Gen / DC supply 2: RFPP LF10A RF Match: 13.56 MHz No endpoint system Process kit type: PIK-I Chamber pump: EDWARD iL70 Turbo pump: LEYBOLD No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 20 SCCM STEC 4400 MFC9 (2) Manifolds N2 300 SCCM MC-3102E-NC MFC10 (2) Manifolds Chamber D: Chamber type: PCII Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: Oxide etch Lid type: RF Resonator RF Gen / DC supply 1: COMDEL CPS-1001S RF Gen / DC supply 2: RFPP LF10A RF Match: 13.56 MHz No endpoint system Process kit type: PIK-I Chamber pump: EDWARD iL70 No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 20 SCCM STEC 4400 MFC12 (2) Manifolds N2 300 SCCM MC-3102E-NC MFC13 (2) Manifolds Chamber 1: Chamber type: STD WC Body Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: ESC AL Lid type: 12.9" RF Gen / DC Supply 1/2: AE MDX-L12M Susceptor / Pedestal: MCA ESC Heater / Cathode cooling: NESELAB I No endpoint system Gate valve position: 3 POS Process kit type: ESC AL Chamber pump: Cryo pump (OB8F-3 Phase) No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 100 SCCM STEC 4400 MFC18 (2) Manifolds N2 20 SCCM STEC 4400 MFC9 (2) Manifolds Chamber 2: Chamber type: Wide body Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: TTN Lid type: 12.9" RF Gen / DC Supply 1: AE MDX-L12M Susceptor / Pedestal: 101 No endpoint system Gate valve position: 3 Pos Process kit type: (2) Ti/TiN Chamber pump: Cryo pump (OB8F-3 Phase) No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 300 SCCM STEC 7440 MFC9 (2) Manifolds N2 100 SCCM STEC 4400 MFC10 (2) Manifolds Chamber 3: Chamber type: Wide body Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: TTN Lid type: 12.9" RF Gen / DC Supply 1: AE MDX-L12M Susceptor / Pedestal: 101 No endpoint system Gate valve position: 3 Pos Process kit type: (2) Ti/TiN Chamber pump: Cryo pump (OB8F-3 Phase) No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 100 SCCM STEC 4400 MFC2 (2) Manifolds N2 300 SCCM STEC 4400 MFC3 (2) Manifolds Chamber 4: Chamber type: Wide body Manometer config: Single Manometer 1: 100mTorr No shutter option Chamber process: TTN Lid type: 12.9" RF Gen / DC Supply 1: AE MDX-L12M Susceptor / Pedestal: MCA ESC Heater / Cathode cooling: NESELAB I No endpoint system Gate valve position: 3 Pos Process kit type: ESCAL Chamber pump: Cryo pump (OB8F-3 Phase) No heated valve stack Gas MFC Size MFC Type MFC Number Gas stick N2 20 SCCM STEC 4400 MFC4 Single N2 100 SCCM STEC 4400 MFC5 (2) Manifolds N2 200 SCCM STEC 4400 MFC6 (2) Manifolds Missing ES chuck System power: 200 VAC, 60 Hz, 3 phase, 343 A,150 kVA 2001 vintage.