中古 AIXTRON Crius 31x2" #9248204 を販売中

MOCVD System CCS IC Reactor for deposition substrates CSS-Chamber With flip-top lid SiC Coated graphite susceptor (3) Zones tungsten heater Temperature: 1200°C Optical access: (6) Optical ports Outer liner Heat exchanger Pyrometer: Temperature calibration Power supply unit EBARA A70W Dry vacuum pump Dual input plenum shower head injector With cross-flow water cooling Glove box: With inert gas flow (3) Gloves on each side Pressure control: Over pressure protection Monitoring systems interface Maintenance load lock Gas purification Circulation and regeneration unit Sensors: Integrated H2 / O2 / Moisture / Temperature Moisture level: 1 ppm Oxygen level: 1 ppm Vacuum wand Vacuum system: (2) Pressure sensors Throttle valve Vacuum valves Check valves Filter station Gas blending unit: Ventilated gas cabinet with active door locks Gas blending and injection lines Metal sealed digital mass flow controllers Input lines: Particle filters Hydride input lines: Manual valves Hydrogen and nitrogen carrier gas manifold Run / vent stack (Hydrides and (2) MOs) Purge channels Vacuum cleaner With closed loop circulation and separate blower unit Particle trap and double fine filter Dynamic reactor height adjustment In-recipe control of reactor height Computer control system CONTROL LOGIX Programmable Logic Controller (PLC) Recipe execution Recipe manager Macro definition Display and print out of data Remote PC: Desktop PC TFT Monitor, 9" Mouse Keyboard Safety system: Hardwired safety system Hydrogen detection MO-G1 Standard metal organic channel: (2) Cp2Mg/H2 TMAl/H2 N.N./H2 N.N./N2 TEGa/N2 Digital mass flow controller for carrier gas Digital mass flow controller for pusher line Pneumatic 4-way valve Thermostated bath LAUDA RM6 air-cooled with precise temperature control Digital pressure controller for MO-cylinder Pneumatic 5-way vent / Run valve PLC Hardware and system MO-G1-D Double standard metal organic channel: (2) TMIn (2) Metal organic sources sharing thermobath (2) Digital mass flow controllers for carrier gases (2) Digital mass flow controllers for pusher line (2) Pneumatic 4-way valves Thermostated bath LAUDA RM6 air-cooled with precise temperature control (2) Digital pressure controllers for MO-cylinder (one for each cylinder) (2) AIXTRON Pneumatic 5-way vent / Run valves PLC Hardware and safety system MO-G2-D Double standard gas channel: (2) NH3 Manual valve (2) Digital mass flow controllers for hydride gases (2) Digital mass flow controllers for pusher line (2) Pneumatic 3-way valve (2) Pneumatic 5-way vent / Run valves PLC Hardware and safety system MO-G1 Plus MO-G3 sharing one bath: (2) TMGa (2) Digital mass flow controller for carrier gases (2) Digital mass flow controller for pusher line Digital mass flow controller for dopant injection (2) Pneumatic 4-way valve Thermostated bath lauda RM6 air-cooled with precise temperature control (2) Digital pressure controller Pneumatic 5-way vent / Run manifold valve PLC Hardware and safety system MO-G5-10M Vacuum lines MO-G6 Dummy line: Used for balancing gas flow switching Digital mass flow controller Pneumatic 5-way vent / Run valve PLC Hardware and safety system N2/H2 Separation of MO stack: (4) Pneumatic valves and safety system (2) N2/H2 Mixture units for one run / Vent stack Digital mass flow controller with valve and safety system (2) MO-Differential run / Vent pressure balancing Differential pressure sensor X-More MFC and needle valve PID Controller PLC Hardware and safety system Process control: Laser interferometer In-situ monitoring Includes: Susceptor top plate: SiC Coated QUARTZ Susceptor support Liner Thermocouple assembly type C Optical probe Probe adapter O-Ring Engineers kit (2) Valves (N2 H2) Line heating Susceptor: 2" x 31" x 2" CT1000 Particole trap Purification: AERONEX CE-2500KF Purifier For NH3 purification Manual by-pass shut off valve (2) Manual isolation valves (2) AERONEX CE-2500KF Purifiers For N2 and H2 (2) Moisture sensors (H2 N2) MICHELL PURA Hygrometer DP Measurement: -120°C 2008 vintage.