中古 TEL / TOKYO ELECTRON Clean Track ACT 8 #9182601 を販売中

(3) Coaters / (3) Developers, 8" General system configuration: Left to right Carrier type: Notch type, (25) Slots System power rating: AC 208V, 3-Phase for system, 173A (Max) Loading configuration: (4) Loaders Uni-cassette Software version: 3.04.130 (3) Main controllers Main system details: Main frame with system controller Carrier station Type: Normal cassette type Cassette: (25) Slots Coater unit details (2-1, 2-2 module): (8) Dispense nozzles with temperature controlled lines for etch unit (16) RRC Pumps PR Suck-back valve: (16) AMC Suck-back valves Rinse nozzle: Back / EBR / Solvent bath for etch unit Rinse system: 3-Liter 2-tank buffer tank system Programmable side rinse PR Supply (1, 2, 3, 4, 5, 6, 7, 8): (8)Bottles (1-Bottle / 2-Nozzle) Solvent Supply CCSS Supply E.B.R Flow system: CCD Type Drain type: Direct drain system (Including a pump) TCT Unit details (3-2 Module): (3) Dispense nozzles with temperature controlled Resist 1, 2 RRC pump (F-T201-1) Resist 3 RDS pump (R GEN tm-01) PR Suck-back valve: (3) AMC Suck-back valves Rinse nozzle: Back / EBR / Solvent bath for etch unit Rinse system: 3-Liter 2-tank buffer tank system Programmable side rinse PR Supply (1, 2, 3): (3) Bottles (1-Bottle/1-Nozzle) Solvent supply: CCSS Supply E.B.R Flow system: CCD Type Drain type: Direct drain system (Including a pump) Developer unit details (3-1, 3-2, 3-4 Module): (1) LD Nozzle for each unit (3) Dispense nozzles with temperature controlled (1) Stream nozzle for DI rinse 2-Point for back side rinse on each unit Developer system: (3) 3-Liter 2-tank buffer tank system Developer supply: CCSS Supply Developer temperature control system Drain: Direct drain I/F Wafer stage type: NIKON Type (S206) (2) Adhesion units details: HMDS Tank with float sensor in system HMDS Supply: Local canister supply (3) Precision hot plate stations (PHP) (6) Precision chilling hot plate stations (PCH) (2) Cup washer holders (CWH) (4) High chill plate stations (HCP) (1) Chill plate station (CPL) (2) High temp hot plate stations (HHP) (5) Low temp hot plate stations (LHP) (2) Transition stages (TRS) (1) Transition chill plate (TCP) Chemical cabinet #1: PR Bottle & 2-1, 2-2 COT pump HMDS Buffer tank assembly Solvent buffer tank Solvent filter assembly Developer buffer tank & developer / DI filter assembly Chemical cabinet #2: HMDS Canister tank Temperature & humidity controller: Type: SHINWA ESA-8Series (TEL OEM) Temperature control unit (TCU): Type: TEL OEM AC Power box: AC 200/220V Full load current: 173A System configuration: (1) UNC: Uni-cassette stage (1) TCT: TARC Process station (2) ADH: Adhesion process stations (3) PHP: Precision hot plate stations (6) PCH: Precision chilling hot plate stations (2) CWH: Cup washer holders (2) SHU: Shuttles (2) COT: Coat process stations (3) DEV: Develop process stations (4) HCP: High speed chill plate stations (1)CPL: Chill plate station (2) HHP: High temperature hot plate stations (5) LHP: Low temperature hot plate stations (2) TRS: Transition stages (1) TCP: Transition chill plate Other system details: In-Line CSB, PRB1, PRB2, IFB Power box, T&H Controller 1 Chemical box 1, 2 Thermo-controller 1 2004 vintage.