中古 FSI / TEL / TOKYO ELECTRON Mercury MP #9161972 を販売中

Spray processor, 8" Software: 11 FSI Standard exhaust config: Yes Dual exhaust: No Turntable style (PFA vs. Ti vs. SS): PFA 918600-003 Motor and motor speed controller: Upgrade 232608-003 Booster pump: Yes, not dual Helios: Yes Ti T/C's: No Canister remote length: 25' Vertical lift kit length: 20' Vertical lift kit: Some canisters Center SP etch probe: No SBSP: Yes SBSP Etch probe: Yes I/R Htr(P)ost Man / (C)hem spec: No I/R Heater split manifold: No I/R Heater bypass valves: No CPU 286: No CPU 486 25 mH: No CPU 486 80 mH: No CPU 586 Yes: 922081-001 HF Last: Yes LPP w / Flowmeter: Yes HF Last rinse bypass: Yes DI MIX: Yes H2SO4(Analog vs. NT): Yes H2O2 (Analog vs. NT): NT 30-300, 915191-102 HF400: Yes HF402 (Analog vs. NT): NT 15-150, 915191-101 HCL (Analog vs. NT): NT 15-150, 915191-101 NH4OH (Analog vs. NT): NT 15-150, 915191-101 Can position 1: Sulphuric (H2SO4) Can position 2: Hydrofluoric (10:1) Can position 3: Hydrofluoric (10:1) Can position 4: Ammonium hydroxide (NH4OH) Can position 5: Hydrochloric (HCl) Can position 6: Hydrogen peroxide (H2O2) HF / DI On-line blending: Yes Manifold type: PFA DI Flow switch / monitor: No N2 Flow monitor: No Recirculation: No Chemical heater (Stand alone): No N2 Heater: No UPS: No Component rinse: No SECS Comm: Yes Rear access: Yes Chemical sampling: No Photohelic monitor: Yes MHS: No Dual canister rotary board: No Autofill: HF- SULFURIC Remote touchscreen: No Dual touchscreen: No Direct feed: No Process application #1: RCA Clean Process application #2: B Clean Process application #3: SPM Only Process application #4: HF Last Pressure / Flow settings Bowl exhaust - IWC: 0.8 +/- 0.2 Bowl exhaust - FPM: N/A 1996 vintage.