中古 CANON MPA 600 FA #9316593 を販売中

Mask aligner JEIDA Flat-finder, 6" Wafer chucks Astigmatism: < 2.0 µm Method: Measure vertical and horizontal Focus: < ± 2.0 µm Method: Deviation using tilting mask Uneven focus: < 2.0 µm Intensity: > More than 400 mW Method: SLIT 1.6 mm Uniformity: < ± 3% Method: 11-Points measure integrated intensity in CANON IUC-M3 Distortion: [MX] ≤ 0.4 µm, [MY] ≤ 0.4 µm, [DR] ≤ 0.3 µm 3σ ≤ 0.5 µm Exposure performance: Exposure field: R 95 mm Resolution: 1.8 - 2.0 µm Exposure wavelength: 365 nm (L), 405 nm (H), 436 nm (G) Line complex wavelength Reduction ratio: x1 D.O.F: ± 8 um (1.8 - 2.0 µm Line and space) Illuminator: Light source: 2.0 kW Super high pressure mercury lamp Wafer alignment: Alignment light source: He-Ne Laser (633 nm) Alignment system: LBS (He-Ne Laser scan AA) Alignment accuracy (3δ): ≤ .60 µm Scanning mechanism: Scan drive unit: Scanning carriage unit by DC motor drive Scan range: 6" (160 mm), 5" (141 mm), 4" (119 mm) Scanning speed: 5 to 150 sec (25 mm/sec - 0.83 mm/sec) Alignment scope: Viewing scope light resource: New style LED type Erector lens: Viewing lens: Manual moving Erector: 1x, 2x, 3x Mechanical pre alignment: Pre alignment accuracy (Range): Φ 100 µm or less Power supply: 200 VAC.