中古 VARIAN / AMAT / APPLIED MATERIALS VIISta 80 #9217499 を販売中

Ion implanter No SMIFs or dry pumps Implant dose performance: Dose range: 2E12 - 1E16, (4E12 – 1E16 ions/cm2 - quad mode) Uniformity: ≥10 keV, 1 sigma ≤1.0% mean dose across wafer 500 eV to 10 keV, 1 sigma ≤1.5% mean dose across wafer Repeatability: ≥10 keV, 1 sigma ≤0.7% mean dose of wafers 500 eV to 10 keV, 1 sigma ≤1% mean dose of wafers Beam parallelism ±1º in X and Y axis for ≥10 keV drift Ion mass resolution: M/DeltaM > 60 FWHM Process angles: Tilt: ±45º; 2 axis; Programable in 1º steps; accuracy ±0.5º Orientation: 0 - 360º; programable in 1º steps; accuracy ± 1º Rotation: Equivalent multi-tilt, quad mode Wafer cooling: Gas cooled electrostatic platen 200mm < 100ºC @ 800 W beam power 300mm < 100ºC @ 1200 W beam power Particulate control: Frontside: ≤0.15 particles added/cm2@ ≥0.16μm particles Max throughput (wph): 200mm, 300mm Min 2 scans (4 passes): ≥250, ≥230 Wafer handling: Backside pick and place wafer orientation Load locks: (2) Independent cassette load locks FOUP/cassette buffer compatible – 4 SEMI E15.1-0298 load ports AGV compatible SMIF compatible Wafer breakage: MWBB 1:100,000 Metals contamination: Al < 50ppm of implanted dose Transition and heavy metals (Fe, Cr, Ni, Cu) < 5ppm of implant dose 1999 vintage.