中古 CHA Mark 40C-RH #9390229 を販売中

E-Beam evaporator Dual operation Moving substrates Exceptional Film Uniformity (EFU) Sputter up Process stations Round cathodes, RF or DC (Up to 4-stations) Co-deposit Bias, RF or DC Substrate heating, 400°C, multi-element Substrate heating station Electron beam Thermal Ion beam pre-clean / Etch Plasma texturing/etch Cryo coil: 1,000 L/Sec Process chamber Insitu spectrophotometer Drop well source Easy access to front and rear door Variable source-to-substrate distance Utilities Water supply, 10 GPM Air supply, 85-125 PSIG Deposition fixturing adjustable angle planet Vertical drum with pallets Rotating disk Rotating dome Flat planetary Shutter Pumping stack Dry or oil sealed roughing pump Regeneration options Famous right angle pumping/plumbing Exceptional pumping performance High vacuum valve, vertical seal, 16" Foreline and roughing valves, vertical seal, 3" Large refrigeration vapor pumping options Mechanical pump, minimum CFM Molecular sieve trap Cold trap LN2, 25L pump trap, optional water pump LN2 level control Ionization gauge control Gas controls Pumping options: Cryo Turbo Diffusion Ultimate vacuum: System: 10^-9 Torr Chamber:10^-8 Torr Power supply options: Electron beam: 6-10-15 kW Sputtering: 1-3-5-15-30 KW Heater: 6-10-16 kW Thermal deposition: 1-5-10 kW.