中古 YES / GLEN R3 #9251749 を販売中

Plasma cleaner Low frequency Mass Flow Controller (MFC) N2 Flow rate: 1.7 SCFM Process gas flow rate: 20-50 SCCM Chamber material: 6061-T6 Aluminum RF Plasma power: 0 - 500 W at 550 VAC Nitrogen consumption: 0 SCFM idle, 1.7 SCF Reactant gas consumption: 0 SCFM Idle, 150 SCC KF 40 Vacuum plumbing Clean room capability: Class 10 Compliance: SEMI S2 Touch screen interface Analog MFC control and monitoring Thermocouple monitoring for etch uniformity Safety factors: Integral RF and pressure interlocks TCP/IP Port Self-diagnostic program Constant real-time display Audible and visual cycle complete indicators Audible and visual indication of incorrect process with diagnostics display Vacuum sensor: 0-1000 Torr With (2) trip points Load capacity: Up to 4 active plasma areas: 15.13" x 15.39" Operational modes: RIE Downstream electron-free Active ion trap Grounded ion trap Measurements: Interior chamber dimensions: 450 x 450 x 300 mm Chamber process area: 931 in² or 233 in² Power supply: 230 V, 20 Amps, 50/60 Hz, Single phase 1994 vintage.