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ID: 293730451
Plasma cleaner
EDWARDS iXH100 Vacuum pump
(8) Standard shelves
(3) Standard gases
(3) Mass Flow Controllers, up to 3 for gas mixing
Gases: O2, N2
Operation temperature: 20 - 100°C
N2 Flow rate: 1.7 SCFM
Process gas flow rate: 20-50 SCCM average
Interior chamber dimensions: 45.72 cm (W) x 45.72 cm (D) x 30.48 cm (H)
Chamber process area: 18" x 18" x 12"
Chamber material: 59.69 cm (W) x 71.12 cm (D) x 113.284 cm (H) (23.5" x 28" x 44.6")
Process gas inputs: 6061-T6 aluminium
SEMI™ Compliance: S2/S8
Number of recipes: 12 with load/save/loop/link capability
Range of exposure time: 0-1200 seconds (20 minutes)
Resolution of timer setting: 1 Second
Performance:
RF Plasma power: 0-1000 watts @ 550 VAC, selectable power
RF Leakage magnetic: 0.6 mA/m, 4.15 x 10-7 A2/m² Average
RF Leakage electrical: 1.6 V/m, 4.2 V2/m² Average
Nitrogen consumption: 0 SCF idle, 6.8 SCF peak, 1.7 SCF average
Power consumption with Pump: 375W idle, 1000W peak, 640W average
Reactant gas consumption: 0 SCF idle, 20-50 SCCM
Heat emission: 920 watts average
Power requirements: 200-250 V, 20 Amps, 50/60 Hz, 1 Phase.
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