中古 TEGAL 903E #115926 を販売中

Plasma etcher, in-line single wafer, 4" Can handle 3" to 6" wafers, currently configured for 4" Cassette to cassette Etches silicon dioxide, silicon nitrides, and polyamid es Microprocessor control ENI 1,000 Watt 13.56 MHz RF Generator 20 Process recipe capability Process gases controlled by Tylan MFC’s Non-friction spatula pick and place wafer transport. LEYBOLD D65 oxygen service pump (optional dry pump available) Two Tegal closed loop temperature controllers DEC Monitor and keyboard Non-friction spatula pick and place wafer transport Wafer count: 834,009 Manuals included CDA / N2 regulated to 80 +/- 5 psi N2 regulated to 15 to 30 psi Process gas's regulated to 15 +/- 5 psig O2 clean regulated to 10 +/- 5 psi 903e vacuum pump connection: KF-40 flange 903e cabinet exhaust connection: 4", 100 cfm Leak-back rate: 5.3 mTorr per minute System: 200 to 240 VAC selectable, 50 / 60 Hz RF generator: 200 to 240 VAC selectable Monitor: 115 VAC Vacuum pump: 200 to 230 VAC, 3-phase Temperature controllers: 115 VAC Demonstrable.