中古 PLASMATHERM SLR 730 #9363419 を販売中

PECVD System 720 RIE (Reactive Ion Etcher) 700 Aluminum body chamber Stand alone dual chamber 730/720 deposition and etch system Substrate holders configured for 4"-8" Load lock version with (2) process modules: PECVD RIE (Reactive Ion Etcher) Main body: Stainless steel skins Windows based PC controls ADVANCED ENERGY RFPP RF5S Power supply, 500 W-13.56 MHz ADVANCED ENERGY AM5 Matching network with tuner LEYBOLD D25 / Equivalent load lock pump NESLAB HX 75 Chiller with RS232 interface to system Electrical disconnect box: 208 V, 3 Phase, 60 Amp Flat panel display with keyboard and mouse Manuals PECVD Module: Heated chuck WATLOW Controller Chuck with center lift type, 11" Optical windows for endpoint control and diagnostics LEYBOLD D40 With 151 blower mechanical pump MKS 290 Ion gauge controller and ion gauge MKS TC Gauge controller (1 or 2) Torr baratron (4) Gas MFC's (Can add up to 4 more) RIE Module: Lower electrode Shower head, 11" Center lift type chuck, 11" Optical windows for endpoint control and diagnostics Soffie class III laser endpoint detector MKS 153 Throttle valve LEYBOLD 361C Turbo pump LEYBOLD 150 / 360 NT Turbo controller LEYBOLD D40BCS Mechanical roughing pump 500mT Baratron Gas manifolds and gas line: (4) Gas sticks / Lines Nupro valves with bypass valves Unions Glands VCR Fittings MFCs and Gas manifolds PLASMATHERM Dual chamber PECVD / RIE system: (2) 4-Port manifolds (2) Gas sticks for Nitrogen and Argon to include nupro valve MFC and L leg to gas connection (2) Gas sticks with bypass: (3) Nupro valves and MFC's (2) 4 Channels valve control PCB 1/8" Tubing for the nupro valves, ~40 ft Flow rates: PECVD: Nitrogen: 2000 SCCM Argon: 500 SCCM RIE: BCL3: 50 SCCM Cl2: 50 SCCM 1994 vintage.