中古 LAM RESEARCH Rainbow 4520i #9180717 を販売中

Dry etcher, 6" Clamped chuck Verity enhanced endpoint detection Hines indexers Matching network: LoFat ISO Matcher: Yes Top and bottom RF cables: Standard Chamber process kit parts: Pick and place wafer transport with non-wafer contact optical alignment Inductive RF auto tuning: Fast accurate RF tuning for precise control Active temperature control of upper and lower electrodes Vacuum load-locked low pressure oxide system Parallel plate reactor: Proven etch technology Variable gap spacing: Wide process flexibility Integrated isotropic-anisotropic etching (2) Active chambers Flat notch orientation Upper and lower baffles Electrode clamp ring Attachment ring Filler ring lower clamp Focus ring edge lower Vespel confinement ring Bottom wafer clamp Bell jar Single wafer 4520i Isotropic etch chamber: Integrated into entrance load-lock 1250 Watt solid state Water cooled remote isotropic chamber RF generator RF Match housing resides at the left side of the isotropic module (3) MFCs For isotropic chamber Pressure controller for helium backside wafer cooling Hinged upper housing of isotropic chamber Air blower assembly OEM Specifications / Typical results: Dry pumps / Chiller not included Selectivity BPSG/TEOS to poly: >15:1 Thermal oxide etch rate: ≥ 4500A/min BPSG Etch rate: >7500 A/min TEOS Etch rate: >5000 A/min Particles: 0.3μm size Uniformity: +/- 10% 3 4520 Anisotropic etch chamber: Single wafer etch: Individual wafer etch Wafer temperature control: Reduced loading effects Profile control with extended over etch LAM RF Generator rack: Main RF generator ISO AE RFG 1250 RF Generator 2004 vintage.