中古 LAM RESEARCH 2300 Versys #9101595 を販売中

Polysilicon etcher, 12" Conducting layer dry etching system 23PM, MW 1PM System (4) Chambers 2300 Transport module (3) 2300 Kiyo45 etch process module 2300 Micro wave strip process module (3) LSR Endpoint Gas system: Gas interface box, 3PM (IGS GB) (3) 9 Gas configuration (3) Additional gas line (AGS)/total 16 lines (3) Two heated gas line US option: System UPS circuity Seismic bracket (TM/PM/MWS) System weight dispersion plate (for TM/PM/RPM) ELB with ring lug - Qty 1 (3) Keyence BCR carrier ID User interface: side monitor UI (25) Slot input buffer station Japanese safety label Intermitted Buzzer ULPA filter interlock Service step for PM (3) FOUP Config. Additional gas line for MWS (3) Label for gas name and flow direction (3) Duct manifold exhaust PM to GB Chamber A: Chamber type:MWS Gas config. (sccm)=MFC full scale N2(1000), O2(5000), H2/N2(2000) MW 2.45GHz, max 3000W Stage heater max 300°C Chamber B: Chamber type:Kiyo45 Gas config. (sccm)=MFC full scale SiCL4(100), CF4(300), CL2(200), NF3(500), HBr(500), NF3(50), CH2F2(100), CHF3(300), SF6(50), N2(100), O2(30), O2(500), Ar(500), He(500) Source 13.56MHz, max 1500W Bias 13.56MHz, max 1500W Stage heater max 70°C Chamber C: Chamber type:Kiyo45 Gas config. (sccm)=MFC full scale SiCL4(100), CF4(300), CL2(200), NF3(500), HBr(500), NF3(50), CH2F2(100), CHF3(300), SF6(50), N2(100), O2(30), O2(500), Ar(500), He(500) Source 13.56MHz, max 1500W Bias 13.56MHz, max 1500W Stage heater max 70°C Chamber D: Chamber type:Kiyo45 Gas config. (sccm)=MFC full scale SiCL4(100), CF4(300), CL2(200), NF3(500), HBr(500), NF3(50), CH2F2(100), CHF3(300), SF6(50), N2(100), O2(30), O2(500), Ar(500), He(500) Source 13.56MHz, max 1500W Bias 13.56MHz, max 1500W Stage heater max 70°C Damaged/missing parts: PM1 MW Generator, ASTEX FI20160-3 PM3 TMP Controller , Edwards SCU-1500 PM4 TMP Controller, Edwards SCU-1500 2008 vintage.